Row-structure stencil planning approaches for E-beam lithography with overlapped characters

نویسندگان

  • Jian Kuang
  • Evangeline F. Y. Young
چکیده

Character projection is a key technology to enhance throughput of E-beam lithography, in which characters need to be selected and placed on the stencil. This paper solves the problem of planning for rowstructure stencil with overlapped characters and also considers multi-column cell system for further throughput improvement. We first propose an approach that is designed for characters with “regular” left and right blank spaces, which is an integrated framework to solve the subproblems of character selection, row distribution, single-row ordering and post-refinement efficiently. We then present another approach that can optimize stencil planning with general characters. Experiments show that both approaches remarkably outperform the existing methods on different sets of benchmarks. We can achieve significant throughput improvement and remarkable speed-up comparing with previous works. & 2016 Elsevier B.V. All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Etching of sub-micrometer structures through Stencil

The processing techniques for micro and nano devices fabrication can be divided into two groups. On one hand, there are the techniques that allow the modification of a given substrate, e.g. ionic implantation, metallization, etching and thermal processes to either grow or deposit insulator layers. On the other hand, there are the processes that allow a pattern transfer of the designs onto the s...

متن کامل

Parekh , Vishal , “ Process Development for Fabrication Of Bit - Patterned Medium For Magnetic Storage Devices ”

The dissertation describes lithographic structuring of large-area patterned medium samples with ~40nm features using ion beam proximity lithography (IBPL). The quality of the patterns formed in IBPL system is primarily limited by the quality of the stencil masks. Hence, the emphasis of this work has been to develop a reliable mask fabrication process that can achieve a size uniformity that is s...

متن کامل

Writing productive stencil codes with overlapped tiling ‡ 3

Stencil computations constitute the kernel of many scientific applications. Tiling is often used to improve 11 the performance of stencil codes for data locality and parallelism. However, tiled stencil codes typically require shadow regions, whose management becomes a burden to programmers. In fact, it is often the 13 case that the code required to manage these regions, and in particular their ...

متن کامل

Metallic nanowires by full wafer stencil lithography.

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 mum long have been achieved showing a resistivity of 10 microOmegacm for ...

متن کامل

High-Throughput Top-Down Fabrication of Uniform Magnetic Particles

Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)-10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stencil mask containing an array of circular openings is illuminated by a broad beam of energetic (5-8...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • Integration

دوره 55  شماره 

صفحات  -

تاریخ انتشار 2016